User manual CADENCE DESIGN SYSTEMS MASKCOMPOSE RETICLE DATASHEET
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Manual abstract: user guide CADENCE DESIGN SYSTEMS MASKCOMPOSE RETICLEDATASHEET
Detailed instructions for use are in the User's Guide.
[. . . ] CAD E N C E M A S K C O M P O S E R ET I C LE AND WAFE R SY N T H E S I S S U I T E
DATASHEET
CADENCE MASKCOMPOSE SUITE
Within the Cadence MaskCompose suite, technology-and fab-specific requirements for the tapeout flow are captured by appropriate specialists at high levels of abstraction using a "definition module" GUI. Once captured, this flow definition information can be used over and over again by "implementation modules" to automatically generate appropriate circuit-specific output data. [. . . ] After entering a few simple pieces of information, the program is executed and generates the reticle design and associated wafer layout in conformance with the requirements set forth in the definition module.
FEATURES
FRAME gENERATION AND wAFER lAyOUT
· Supportformulti-dieclustering · Supportformulti-layerreticles · Testdieinsertion
BENEFITS
· Providesahighlyefficientand environment-independent design tapeout system · Adefinitionvs. implementationparadigm allows users to take advantage of the benefits of automation (productivity, repeatability, fewer errors) while still satisfying the unique requirements of target process technologies and manufacturing environments · Simplifiessame-technologycell qualification through easy incorporation as optional test data into reticle designs · Automaticpaperworkgeneration boosts productivity and brings repeatability and accuracy to a process that is particularly error-prone when handled manually
Figure 2: Automatically generated reticle frame diagram
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C A D ENC E MA SKCO MPO SE RETI C LE A N D WA FER SYNTHESI S SUI TE
2
Thedefinition/implementationpartitioning of the MaskCompose suite lends itself to a cross-discipline usage model. Floorplan definitions may be created and controlled byphotomasking/lithographyorCAD specialists while actual design-specific implementations can be handled in the design group by the layout specialist. layer polarities andmin/maxscribesizes. Includeditems may be defined as required vs. Scribe sizes may be specified in terms of a minimum size, maximum size, and an increment value by which the scribe size is increased until all required features are placed or maximum size is reached. Definitions may be constrained to allow for various types of equipment mix and match(forexample, 1x/5xmixesor stepper vendor combinations).
Interactive wafer module
The user also has the ability to manually manipulate and control the wafer layout or stepping patterns. The interactive wafer module provides the following user controls: · Addordropexposures(shots) · Add, delete, move, copy, andplace drop-in(s) · Modifyorintroducerowand column shifting · Markadditionalnon-yieldingdie
archive documentation, can be generated. Because information is extracted directly from the MaskCompose database, content consistency is assured. As an option, documents can include automatically generated postscript and pdf diagrams of generated frame data. Information that is not captured or generated by MaskCompose can be extracted from files or prompted for at runtime by embedding appropriate commands in the various templates used. Based on the directions in a template, text entry fields, option menus, or other appropriate interface components will appear in the user's screen at runtime to prompt for and to collect the relevant information needed to generate the desired documents.
AUTOMATIC PAPERwORK gENERATION
· Templatebased · Customformats · Postscriptdiagrams · Accesstogeneratedand external information · Externalprogramaccess The MaskCompose paperwork generation module uses information generated by other MaskCompose modules and other provided information to rapidly create easily readable documents with customizedformats. Variouskindsof documents, including mask order forms, stepper tooling forms, and internal
AUTOMATIC jOBDECK gENERATION
· Rapidgenerationofmask vendor-specific jobdecks · Enablesmix-and-matchstepper environments The MaskCompose jobdeck generation product works cooperatively within the MaskCompose environment using existing, relevant information made available by other modules. Frame
Multi-circuit and multi-layer mask generation
The automated cluster builder may be used to quickly and easily define die clusters. Any number of circuits of various sizes may be quickly composed into a cluster using this capability. [. . . ] Other relevant information made available by the frame generation and fracture preparation processes includes: · Plate-relativechip/rowvalues · Slicecodevalues · Titling · Magnification · Fracturedpatternnames · Addressunit/spotsizeinformation
CADENCE SERVICES AND SUPPORT
· Cadenceapplicationengineerscan answer your technical questions by telephone, email, or internet -- they can also provide technical assistance and custom training · SourceLink® online customer support gives you answers to your technical questions -- 24 hours a day, 7 days a week -- including the latest in quarterly software rollups, product release information, technical documentation, software updates, and more · Cadence-certifiedinstructorsteach more than 80 courses and bring their real-world experience into the classroom · Morethan25InternetLearningSeries (iLS) online courses allow you the flexibility of training at your own computer via the Internet
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